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SCALE: Self-Supervised Constraint-Aware Layout GEneration for Local P&R DRV Fixing at Advanced Nodes

Summary

SCALE is a self-supervised framework that generates violation-prone layout variants to train a DRC-VLM, improving DRV fix rates by 12-25% on sub-2nm nodes.

SourcearXiv Computer VisionAuthor: Chia-Tung Ho, Haoyu Yang, Guanglei Zhou, Yoshi Nishi, Yaguang Li, Walker Turner, Cunxi Yu, Yiran Chen, Brucek Khailany
SCALE: Self-Supervised Constraint-Aware Layout GEneration for Local P&R DRV Fixing at Advanced Nodes
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[Submitted on 23 Jul 2026]

Title:SCALE: Self-Supervised Constraint-Aware Layout GEneration for Local P&R DRV Fixing at Advanced Nodes

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Abstract:As semiconductor manufacturing advances toward sub-2nm nodes, local place-and-route (P&R) design-rule violation (DRV) fixing is increasingly limited by complex rule interactions, dense multi-layer routing geometries, and foundry-specific constraints. While Large Language Models (LLMs) have recently demonstrated strong capabilities in EDA scripting and documentation, their application to visual layout understanding remains largely unexplored: diagnosing DRC violations from layout imagery demands precise geometric reasoning and foundry-specific rule knowledge absent from general-purpose VLM training. We propose SCALE, a framework with a self-supervised layout-generation stage for local DRV fixing at advanced nodes. Multi-layer layout geometry is serialized into structured text, and a fine-tuned language model learns to reconstruct randomly masked polygons from surrounding BEOL context alone without violation labels. At inference, natural-language rule constraints and high-temperature sampling steer generation toward diverse, violation-prone layout variants validated by an industrial signoff DRC checker, producing DRC-annotated layout--violation pairs used to fine-tune a domain-adapted DRC-VLM. This VLM provides rule-aware geometric guidance for local DRV repair, boosting state-of-the-art agents' solve rates by +12--25% (up to 97%) on 100 real sub-2nm cases spanning enclosure, spacing, width, and color-spacing violations.

Comments: 8 pages, 5 Figures, 6 Tables

Subjects:

Computer Vision and Pattern Recognition (cs.CV); Artificial Intelligence (cs.AI)

Cite as: arXiv:2607.21850 [cs.CV]

(or arXiv:2607.21850v1 [cs.CV] for this version)

https://doi.org/10.48550/arXiv.2607.21850

arXiv-issued DOI via DataCite (pending registration)

Submission history

From: Chiatung Ho [view email] [v1] Thu, 23 Jul 2026 22:38:04 UTC (10,296 KB)

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Key points and analysis

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Key points

  • Proposes self-supervised layout generation without violation labels, reconstructing polygons from BEOL context
  • Uses natural language constraints and high-temperature sampling for diverse, violation-prone variants
  • DRC-VLM boosts solve rates by 12-25% on 100 real sub-2nm cases, up to 97%

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