[2605.12528] MorphOPC: Advancing Mask Optimization with Multi-scale Hierarchical Morphological Learning
[Submitted on 13 Apr 2026]
Title:MorphOPC: Advancing Mask Optimization with Multi-scale Hierarchical Morphological Learning
View a PDF of the paper titled MorphOPC: Advancing Mask Optimization with Multi-scale Hierarchical Morphological Learning, by Yuting Hu and 6 other authors
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Abstract:As feature sizes shrink to the nanometer scale, accurately transferring circuit patterns from photomasks to silicon wafers becomes increasingly challenging. Optical proximity correction (OPC) is widely used to ensure pattern fidelity and manufacturability. Recent generative mask optimization models based on encoder-decoder architecture can synthesize near-optimal masks, serving as fast machine learning (ML) surrogates for traditional OPC. However, these models often fail to capture the geometric transformations from target layouts to mask patterns, leading to suboptimal quality. In this work, we formulate mask generation as a sequence of morphological operations on local layout features and propose \textit{MorphOPC}, a multi-scale hierarchical model with neural morphological modules to learn these transformations. Experiments on edge-based OPC and ILT benchmarks across metal and via layers show that \textit{MorphOPC} consistently outperforms state-of-the-art methods, achieving higher printing fidelity and lower manufacturing cost, demonstrating strong potential for scalable mask optimization.
Subjects:
Computer Vision and Pattern Recognition (cs.CV); Artificial Intelligence (cs.AI); Hardware Architecture (cs.AR)
Cite as: arXiv:2605.12528 [cs.CV]
(or arXiv:2605.12528v1 [cs.CV] for this version)
https://doi.org/10.48550/arXiv.2605.12528
arXiv-issued DOI via DataCite
Submission history
From: Yuting Hu [view email] [v1] Mon, 13 Apr 2026 14:40:34 UTC (2,575 KB)
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